SBIR Phase I: Development of Innovative Nanoimprint Machines Based on Electrostatic-Force Assisted NIL (EFAN)

This Small Business Innovation Research (SBIR) Phase I research project will investigate the critical issues and feasibility of developing new Nano-Imprint Lithography (NIL) machines using an innovative approach in pressing a mold into the resist. The new approach, coined electrostatic force assisted NIL (EFAN) that uses an electrostatic force rather than mechanical forces or fluidic forces, can overcome many short-comings of the current pressing methods for NIL, offering a broad range of unique advantages, such as more precise alignment accuracy, better imprint uniformity, higher throughput, simpler machine design, and better machine reliability. The proposed research will significantly and broadly impact nano-manufacturing tools as well as nanotechnology product developments, and impact the next generation lithography tools for IC manufacturing.