SBIR/STTR Research Award
Point Of Use Chlorine Gas Generator For Wafer Fabrication
Award amount
$62,420Program and phase
SBIR · Phase IAward year
1993Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Advanced Research Projects Agency
- Recipient company
- Electron Transfer Tech
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
A point of use generator for chlorine gas production is proposed. The generator would provide ultrahigh purity chlorine which is necessary to enhance the growth rate and decrease the impurity level in silicon oxides for silicon device fabrication. The generator will also eliminate the need for environmentally unacceptable organochlorine compounds which are presently used for oxide growth enhancement. ANTICIPATED BENEFITS: The chlorine generator could provide very high purity gas to enhance silicon oxide growth. This would improve silicon device performance and stability.
Technology keywords
Not reported