SBIR/STTR Research Award

High Temperature SiC Power MOSFETs

Award identifier e52e2798cda1229c4ee23975b1d27472fda1ea0c4a158f6e0a4fbf79b4e2a982Awarding agency Department of Defense · Missile Defense Agency

Award amount

$60,000

Program and phase

SBIR · Phase I

Award year

1996

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Advanced Technologies/Laboratories Intl
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Large power handling systems of 1KW to 150KW are required in a many applications ranging from aerospace to consumer electronics to industrial power systems and transportation. Conventional electronic systems, based on silicon or gallium arsenide devices, require a large number of devices enhanced with extra heat sinking and sophisticated control systems to ensure synchronous operation. The extra components increase system weight and size, reduce reliability and can also reduce efficiency. Because of its unique properties, SiC is an ideal material for high temperature and power applications. Its characteristics enable device operation at high temperatures and in high power regimes inaccessible to other semiconductors. In this Phase I program we will develop thin, high integrity device quality oxides for use in SiC high power MOSFETs. The work will focus on the growth of low defect density interfaces by rigorous control of the oxide formation. Success will lead to the design and fabrication of high power, high temperature SiC MOSFETs in Phase II. In Phase III, commercial power MOSFETs as well as analog IC's will be targeted for manufacture.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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