SBIR/STTR Research Award
High Temperature SiC Power MOSFETs
Award amount
$60,000Program and phase
SBIR · Phase IAward year
1996Award details
- Awarding agency
- Department of Defense
- Branch
- Missile Defense Agency
- Recipient company
- Advanced Technologies/Laboratories Intl
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
Large power handling systems of 1KW to 150KW are required in a many applications ranging from aerospace to consumer electronics to industrial power systems and transportation. Conventional electronic systems, based on silicon or gallium arsenide devices, require a large number of devices enhanced with extra heat sinking and sophisticated control systems to ensure synchronous operation. The extra components increase system weight and size, reduce reliability and can also reduce efficiency. Because of its unique properties, SiC is an ideal material for high temperature and power applications. Its characteristics enable device operation at high temperatures and in high power regimes inaccessible to other semiconductors. In this Phase I program we will develop thin, high integrity device quality oxides for use in SiC high power MOSFETs. The work will focus on the growth of low defect density interfaces by rigorous control of the oxide formation. Success will lead to the design and fabrication of high power, high temperature SiC MOSFETs in Phase II. In Phase III, commercial power MOSFETs as well as analog IC's will be targeted for manufacture.
Technology keywords
Not reported