sbir phase i: Hybrid Jet Vapor Rotating Disk Tool for SiC-Thin Film Devices

This Small Business Innovation Research (SBIR) Phase I project will synthesize will demonstrate that a hybrid system combining the attributes of Jet Vapor Deposition and Rotating Disk Reactors solves existing Silicon Carbide film deposition problems and can be developed to create a superior film production tool. The high speed "jet" convectively transports precursors directly to the surface, overcoming diffusion-limited transport rates, and largely avoiding unwanted pre-reactions in the gas phase; the rotation allows the "jets"to uniformly "paint" the surface with precursor. Our Phase I efforts will focus on proving that the hybrid tool will be a superior tool for Silicon Carbide epitaxy--highly desired for microelectronic devices such as high-power, high-temperature, high frequency devices. Potential commercial applications of the research are expected in reliable, micro-fabrication process. The successful development of Silicon Carbide film deposition would represent an important advancement in metal thin film deposition process.