SBIR/STTR Research Award
SBIR Phase I: Hybrid holographic lithography for cost-effective fabrication of nanostructures
Award amount
$150,000Program and phase
SBIR · Phase IAward year
2009Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- Electrooptic Technologies and Application Systems
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- NSF 09-541
- Topic code
- NM
Research abstract
This Small Business Innovation Research Phase I project is to demonstrate a novel nanolithography process, i.e. Hybrid Holographic Lithography (HHL) combining interferometric optical lithography with a Spatial Light Modulator (SLM) imaging technique to enable maskless pattern generation. If successful, the new lithographic method will provide a cost effective means of generating nanostructures that can be applied in many fields.
Technology keywords
Not reported