SBIR/STTR Research Award

SBIR Phase I: Hybrid holographic lithography for cost-effective fabrication of nanostructures

Award identifier ce1b2b81c97462c6edb784a35811387f63d43f7d9d9a7396e18c094e8d81cbf9Awarding agency National Science Foundation

Award amount

$150,000

Program and phase

SBIR · Phase I

Award year

2009

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Electrooptic Technologies and Application Systems
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
NSF 09-541
Topic code
NM

Research abstract

This Small Business Innovation Research Phase I project is to demonstrate a novel nanolithography process, i.e. Hybrid Holographic Lithography (HHL) combining interferometric optical lithography with a Spatial Light Modulator (SLM) imaging technique to enable maskless pattern generation. If successful, the new lithographic method will provide a cost effective means of generating nanostructures that can be applied in many fields.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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