SBIR/STTR Research Award

Laser Chemical Etching of Spectrometer Gratings

Award identifier 9c0bd559a145aba176483b746ce1297d3fbe1b2867588d59186d109db4db0a95Awarding agency National Aeronautics and Space Administration

Award amount

$69,918

Program and phase

SBIR · Phase I

Award year

2003

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Award details

Awarding agency
National Aeronautics and Space Administration
Branch
Not reported
Recipient company
LMC Instrument Corp., D/B/A Revise, Inc.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

We plan to use Laser Chemical Etching (LCE, or also called Laser Microchemical etching, LMC), a direct etch process capable of true high resolution 3-D etching with micron resolution, almost arbitrary depth, high aspect ration, and extremely smooth surface finish (less than 40nm RMS), to produce convex gratings for use in Offner spectrometers. LMC is vastly superior to Excimer Laser Micromachining in essentially every aspect, from LMC's much higher control, uniformity of etch, and reproducibility to LCE's ultra-clean etching with only gaseous by-products (no debris). It has a number of attributes that can make it a better choice than e-beam lithography if production is an issue. We will demonstrate that LMC will allow the production of convex infrared gratings without the fabrication limitations of e-beam/optical lithography and without the limitations of ion milling, conventional etching, excimer laser micromachining, mechanical ruling, or conventional replication processes.

Technology keywords

Not reported

Agency intelligence

National Aeronautics and Space Administration

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