SBIR/STTR Research Award

X-RAY MASK FABRICATION USING "DIAMOND POLYMER FILMS" (DPF) MEMBRANES AND W-ALLOYED DPF ABSORBERS

Award identifier ab228f54daa320a30a569d189194d2cea1cf9cc093c3caaa88b007c54fafe1f3Awarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$49,918

Program and phase

SBIR · Phase I

Award year

1991

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
MOLTECH CORPORATION
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

THIN FILM STRUCTURES BASED ON A NOVEL CLASS OF PREDOMINANTLY AMORPHOUS CARBON FILMS, TERMED, DIAMOND POLYMER FILMS (DPF) CAN BE UTILIZED FOR THE FORMATION OF X-RAY MASKS. LIKE DIAMONDLIKEFILMS, THESE FILMS ARE EXTREMELY HARD, AND POSSESS X-RAY AND OPTICAL TRANSPARENCY. UNLIKE HIGHLY STRESSED, DIAMONDLIKE FILMS, THE STRESS LEVEL IN THESE DPF FILMS CAN BE CONTROLLED (FROM HIGHLY STRESSED TO STRESS-FREE) BY APPROPRIATE ADDITIONS OF ELEMENTS LIKE SILICON DURING THE DEPOSITION. FURTHER, THESE FILMS CAN BE ALLOYED WITH METALLIC ELEMENTS LIKE W TO PRODUCE STRESS-FREE W-DPF FILMS. THESE STRESS-FREE, DPF FILMS CAN BE ""SEAMLESS"LY GROWN ONTO UNALLOYED DPF FILMS AND ACT AS X-RAY ABSORBERS TO FORM X-RAY AND OPTICALLY TRANSPARENT, MECHANICALLY STIFF, DIMENSIONALLY CONFORMED X-RAY MASKS FOR THE NEXT GENERATION OF IC TECHNOLOGIES. ANTICIPATED BENEFITS/POTENTIAL COMMERCIAL APPLICATIONSTHE FORMATION OF GOOD MASK TECHNOLOGY USING DPF FILMS WILL REMOVE ONE OF THE MAJOR OBSTACLES TO COMMERCIAL UTILIZATION OF X-RAY LITHOGRAPHY FOR THE FORMATION OF ULTRA FINE FEATURES LEADING TO THE NEXT GENERATION OF IC TECHNOLOGY.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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