SBIR/STTR Research Award

HTS SNS Devices On Large-area Substrates By Single-source Mocvd

Award identifier d9775fe00e6bde97ec726be08467546f84299a6c3b29faab832679081fda7b87Awarding agency Department of Defense · Missile Defense Agency

Award amount

$49,674

Program and phase

SBIR · Phase I

Award year

1993

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
CONDUCTUS, INC.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

IN PHASE I OF THE PROPOSED EFFORT, A NOVEL, SINGLE-SOURCE METALORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) TECHNIQUE WILL BE APPLIED TO THE FABRICATION OF DEVICES EMPLOYING SUPERCONDUCTING- NORMAL-SUPERCONDUCTOR (SNS) JOSEPHSON JUNCTIONS. CONDUCTUS RECENTLY DEVELOPED A YBCO-BASED SNS JUNCTION USING CaRuO(3) AS THE EPITAXIAL BARRIER LAYER IN THE EDGE JUNCTION GEOMETRY, THE PERFORMANCE OF WHICH IS PROMISING FOR APPLICATION TO SENSORS AS WELL AS CIRCUIT ELEMENTS. SINCE THE CRITICAL CURRENT CAN BE CONTROLLED BY THE THICKNESS OF THE NORMAL BARRIER LAYER, THE FABRICATION OF SNS DEVICES OFFERS PROMISE FOR LARGE-SCALE PRODUCTION BECAUSE THIS THICKNESS CAN BE EASILY CONTROLLED. HOWEVER, THE EXISTING YBCO DEPOSITION TECHNOLOGY IS LIMITED IN ITS CAPABILITY TO UNIFORMLY COAT LARGE-AREA SUBSTRATES. A SOLID-STATE, SINGLE-SOURCE MOCVD TECHNIQUE, WHICH HAS BEEN USED TO REPRODUCIBLY GROW HIGH-QUALITY EPITAXIAL YBCO AND OTHER OXIDE THIN FILMS AND MULTILAYERS ON SUBSTRATESAS LARGE AS FOUR INCHES IN DIAMETER, WILL BE USED TO FABRICATE YBCO/CaRuO(3)/YBCO SNS EDGE JUNCTIONS ON TWO INCH DIAMETER SUBSTRATES. THE UNIFORMITY OF THE ELECTRICAL PROPERTIES OF THE SNS JUNCTIONS WILL BE TESTED.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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