LARGE FILED-SIZE HOLOGRAPHIC LITHOGRAPHY FOR FLAT PANEL FABRICATION

IN THIS PROGRAM, THE FEASIBILITY OF PRODUCING A HOLOGRAPHIC LITHOGRAPHY MACHINE WILL BE INVESTIGATED. SUCH A MACHINE SHOULD HAVE HIGH RESOLUTION, LARGE FIELD MASKS, AND MINIMUM ABERRATION. BOTH THEORETICAL AND EXPERIMENTAL EFFORTS WILL BE MADE IN PHASE I TO FULLY DETERMINE THE LIMITS OF THIS APPROACH AND THE POSSIBILITY OF DESIGNING A PRACTICAL LITHOGRAPHY MACHINE FOR INTEGRATED CIRCUIT APPLICATIONS. TECHNICAL ISSUES INCLUDING MATERIAL REQUIREMENTS, DIFFRACTION LIMIT OF DIFFERENT HOLOGRAPHIC OPTICAL SYSTEM (HOS), ABERRATION, MAGNIFICATION/DEMAGNIFICATION, NOISE ELIMINATION AND POWER DISTRIBUTION AND UNIFORMITY ARE TO BE INTENSIVELY STUDIED WITHIN THE TIME FRAME OF PHASE I. HOLOGRAPHIC MATERIALS THAT CAN PROVIDE IMAGE RESOLUTION <0.1 UM IS AVAILABLE IN THIS PROGRAM BASED ON POC'S PROPRIETARY HOE FABRICATION LABORATORY. LARGE NUMERICAL APETURE AND FEATURE SIZE ARE PROVIDED WITH OUR NOVEL RECORDING AND RECONSTRUCTION GEOMETRY WHICH USES GUIDED WAVE AND EVANESCENT WAVE AS A REFERENCE BEAM. THE HOLOGRAPHIC MACHINE PROPOSED IN THIS PROGRAM EXCLUDES THE EXPENSIVE OPTICAL PARTS ASSOCIATED E-BEAM AND X-RAY LITHOGRAPHY. THEREFORE, THE GOAL OF COST EFFECTIVENESS WILL ALSO BE ACHIEVED.