A Versatile Positioning System for Scanning Probe Microscopy

Probe positioning systems are the limiting factor in scanning probe microscrope performance. Scanning tips are typically positioned by a cylindrical piezoelectric scanner with slow response time and limited precision. OPTRA is proposing an improved sample positioning system that would eliminate the need for lateral proble motion. This system is based on an innovative 2-axis scale based metrology system. A two-tiered translation stage is also proposed which, when coupled with the metrology system, will enhance SPM lateral precision and resolution to the 10 nm level at a scan velocity of 1 mm/sec. The proposed positioning system will be capable of slew rates approaching 1 meter/sec and will provide a range of motion of several square centimeters. These capabilities will allow for rapid total profiling of large wafers.