SBIR/STTR Research Award
SBIR Phase I: Scalable Bulk GaN Crystal Growth
Award amount
$150,000Program and phase
SBIR · Phase IAward year
2009Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- Inlustra Technologies LLC
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- NSF 09-541
- Topic code
- NM
Research abstract
This Small Business Innovation Research Phase I project will demonstrate the feasibility of economical and scalable GaN bulk crystal growth techniques to produce non-polar and semi-polar GaN substrates with a uniformly low dislocation density. The non-polar and semi-polar GaN substrates will be derived from a novel multi-step crystal growth process that yields true bulk GaN single crystals. These substrates will find application in advanced GaN-based devices such as laser diodes and ultra-high brightness light emitting diodes (LEDs).The resulting substrate price reduction will accelerate adoption of GaN substrates by LED manufacturers, and expand LED use in demanding and price sensitive solid-state lighting applications. GaN-based LEDs present exciting long-term prospects for solid-state lighting, via the replacement of inefficient and/or toxic conventional light sources such as light bulbs and fluorescent lamps.
Technology keywords
Not reported