SBIR/STTR Research Award

SBIR Phase I: Scalable Bulk GaN Crystal Growth

Award identifier bc0cffd98f47375ce660f075d7c475b0cfdb5532285efe5806ba2e26a0d50d6eAwarding agency National Science Foundation

Award amount

$150,000

Program and phase

SBIR · Phase I

Award year

2009

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Inlustra Technologies LLC
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
NSF 09-541
Topic code
NM

Research abstract

This Small Business Innovation Research Phase I project will demonstrate the feasibility of economical and scalable GaN bulk crystal growth techniques to produce non-polar and semi-polar GaN substrates with a uniformly low dislocation density. The non-polar and semi-polar GaN substrates will be derived from a novel multi-step crystal growth process that yields true bulk GaN single crystals. These substrates will find application in advanced GaN-based devices such as laser diodes and ultra-high brightness light emitting diodes (LEDs).The resulting substrate price reduction will accelerate adoption of GaN substrates by LED manufacturers, and expand LED use in demanding and price sensitive solid-state lighting applications. GaN-based LEDs present exciting long-term prospects for solid-state lighting, via the replacement of inefficient and/or toxic conventional light sources such as light bulbs and fluorescent lamps.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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