NEW LASER INDUCED DEPOSITION PROCESS FOR MICROELECTRONIC APPLICATIONS

FOR MICROELECTRONICS REPAIRING AND PATTERN DIRECT WRITING APPLICATIONS, AN EXPLORATION OF A NEW LASER INDUCED LIQUID PHASE DEPOSITION PROCESS WILL BE PERFORMED. THE WORK WILL FOCUS ON A NEW ELECTROMECHANICAL DEVICE TO ACCURATELY LOCALIZE THE DISPOSING CHEMICAL AND ON NEW METAL-ORGANIC PRECURSORS. SEVERAL NEW CHEMICAL STRATEGIES AND A SERIES OFNEW GOLD(1) COMPOUNDS WILL BE INVESTIGATED TO IMPROVE THE ELECTRICAL AND MECHANICAL PROPERTIES OF DEPOSITED METAL FILMS. THE DEVELOPMENT OF A PIEZOELECTRIC CERAMIC EJECTOR WILL SUBSTANTIALLY BENEFIT THE DEPOSITION PERFORMANCE WITH CONTROLLABLE APPLICATION QUANTITY AND LOCATION OF PRECURSOR SOLUTION. THE GOAL OF THE PHASE I PROGRAM IS TO INVESTIGATE THE CHARACTERISTICS OF THE LASER INDUCED DEPOSITION PROCESS USING LIQUID DROPLETS GENERATED BY A PIEZO-ELECTRONIC EJECTOR. LASER-INDUCED DEPOSITION PROCESS WILL BE INVESTIGATED USING SEVERAL SOLUBLE PRECURSOR MOLECULES AND THE DEPOSITED LAYERS WILL BE CHARACTERIZED. IN COLLABORATION WITH A SUBCONTRACTED UNIVERSITY DEPARTMENT OF CHEMICAL ENGINEERING, FLOROD CORPORATION PROPOSES TO DEVELOP A COMMERCIALLY USEFUL OPEN AIR GOLD DEPOSITION PROCESS FOR MICROELECTRONIC DEVICES. THE UNIVERSITY'S ROLE IS TO DEVELOP THE METAL ORGANIC CHEMICAL AND FLOROD CORPORATION'S ROLE IS TO APPLY IT.