Nanoscale X-Y Stage for Precision Lithography

The state-of-the-art in the microelectronics industry is being pushed primarily by two motivations: the demand for more circuitry etched per unit area and the demand for higher throughput. Both of these needs can be met by an increase in the speed and/or the resolution of lithography positioning equipment. Proposed herein is an innovative X-Y stage design through which control of positions on the order of nanometers will be attempted while simultaneously increasing stroke length to 300 mm per axis, maximum speed to 1 m/s, and turnaround time to under 100 ms. The proposed design will utilize a macro-micro positioning approach analogous to an audio "woofer-tweeter" arrangement for each axis of the stage. This approach will allow for a decoupling of the positioners coarse and fine motion properties simplifying components and design of the entire system.