SBIR Phase II: Vacuum Ultraviolet Spectroscopic Ellipsometer for Semiconductor Lithography

This Small Business Innovation Research (SBIR) Phase II project will provide a novel, patented sensor of the polarization properties of light for operation in the vacuum ultraviolet spectral range, from ~ 120 to 200 nm. The instrument is a complete polarimeter that measures all four of the Stokes parameters of polarized light. It enables new semiconductor metrology applications and measurements with high precision and accuracy that are not achievable by rotating analyzer ellipsometry. The $30B semiconductor equipment market is continuously challenged to meet changing requirements with decreasing dimensions and thickness of structures on chips. The G-DOAP instrument meets key requirements of the industry for vacuum ultraviolet metrology tools. It also brings new capabilities to surface science investigations in many fields through the product for this market that we will offer. This technology can accelerate progress along the International Roadmap for Semiconductors, which cites VUV tools as a key need.