Ultra-Smooth As-Deposited Optical Films

In the Phase I program, SKION demonstrated the capability of Negative Sputter Ion Deposition to deposit optical thin films with state-of-the-art properties, specifically ultrasmooth surfaces, high packing density, refractive index close to bulk values, andstability to environmental exposure. In Phase II, we propose to utilize these films to fabricate high-quality, economical optical devices for high energy laser applications. Prototype dielectric mirrors will be delivered which have higher reflectivity,lower loss, and higher laser damage threshold than currently available technology, with lower projected costs per unit.SKION will accomplish these goals with a threefold program: technology demonstrations in collaboration with two well-renowned laboratories, design and construction of a flexible multilayer deposition system, and fabrication and testing of state-of-the-artdevices. Dielectric mirrors will be fabricated using tantalum oxide and silicon oxide, two of the optical thin film materials demonstrated in Phase I. The target application will be a high reflectance mirror at the YAG wavelength (1.06 microns) with highlaser damage threshold. SKION will meet with the Army to discuss the most desirable configurations and alternate or additional devices to be delivered. The devices developed in the Phase II program will be scaled up for commercial production.