COMPUTER SIMULATION OF REACTORS FOR CHEMICAL VAPOR DEPOSITION

THE CURRENT COMPUTER MODELS FOR REACTORS EMPLOYING CHEMICAL VAPOR DEPOSITION (CVD) ARE BASED ON SEVERAL SIMPLIFYING ASSUMPTIONS REGARDING THE PHYSICS OF THE FLOW AND CONFIGURATION. THESE MODELS CANNOT BE USED FOR ANALYZING 3DFLOWS IN COMPLEX CONFIGURATIONS. FURTHER, THESE MODELS ARE NOT COST EFFECTIVE. THE OBJECTIVE OF THE PROPOSED WORK (PHASE I AND II) IS TO DEVELOP AN EFFICIENT AND ACCURATE THREE-DIMENSIONAL MODEL FOR CVD REACTORS. THE PROPOSED MODEL IS BASED ON THE SOLUTION OF THE GOVERNING EQUATIONS IN GENERALIZED CURVILINEAR COORDINATE SYSTEM. IT WILL INCORPORATE AN ACCURATE DIFFERENCING SCHEME FOR THE TRANSPORT TERMS AND AN EFFICIENT ALGORITHM FOR THE SOLUTION OF THE NONLINEAR COUPLED ALGEBRAIC EQUATIONS. THE END PRODUCT OF THE PROPOSED RESEARCH WILL BE GENERAL COMPUTER PROGRAM FOR ANALYZING FLUID FLOW, HEAT TRANSFER, AND OTHER PROCESSES IN CVD REACTORS OF PRACTICAL SHAPES. THIS COMPUTER PROGRAM WILL ALSO PROVIDE A FRAMEWORK FOR THE DEVELOPMENT AND VALIDATION OF COMPREHENSIVE REACTION SCHEMES. THE NEW COMPUTER MODEL WILL CONSIDERABLY REDUCE THE COST OF SIMULATION SO THAT MORE NUMERICAL EXPERIMENTS CAN BE PERFORMED. THUS, BOTH TIME AND COST INVOLVED IN DESIGN AND DEVELOPMENT PROCESS WILL BE REDUCED.