GAS-JET DEPOSITION OF OPTICAL THIN-FILMS FOR EXTREME ULTRA- VIOLET AND SOFT X-RAY APPLICATIONS

A GAS-JET DEPOSITION (GJD) TECHNIQUE WILL BE TESTED FOR DEPOSITING SILICON-CARBIDE FILMS AND GOLD-SILICON MULTILAYERFILMS TO MAKE HIGH-REFLECTANCE MIRRORS FOR THE EXTREME UV AND X-RAY SPECTRAL REGIONS. THE OBJECTIVES ARE TO LEARN IF THIS METHOD CAN PRODUCE THE FILMS AT AN ACCEPTABLE RATE, OVER USEFUL AREAS, AND WITH SUFFICIENT REFLECTANCE TO SHOW PROMISE FOR MIRROR APPLICATIONS IMPORTANT TO NASA'S SPACE ASTRONOMY MISSIONS. THE GJD METHOD EXPLOITS SUPERSONIC GAS JETS TO DEPOSIT THIN FILMS OF METALS, SEMICONDUCTORS, INSULATORS, AND ORGANIC MATERIALS AT HIGH RATES ON LOW- TEMPERATURE SUBSTRATES. THE GAS-JET SOURCES WILL BE MODIFIED TO SUSTAIN MICROWAVE DISCHARGES FOR PLASMA-ASSISTEDDEPOSITION OR EQUIPPED WITH TARGETS FOR LASER VAPORIZATION. DURING DEPOSITION, THE FILMS WILL BE ANNEALED BY PULSED- LASER HEATING AND BY BOMBARDMENT WITH HIGH FLUXES OF MODERATE-ENERGY NEUTRAL SPECIES. IN ADDITION, A NEW APPROACH TO COVERAGE OF LARGE AREAS BY THE PERIODIC DEFLECTION OF THE GAS JETS WILL BE TESTED. THE OPTICAL PROPERTIES OF THE FILMS WILL BE CHARACTERIZED. APPLICATION MAY BE FOUND IN OPTICAL COMPONENTS FOR X-RAY LITHOGRAPHY, SYNCHROTRON BEAM LINES, AND SILICON-CARBIDE COATINGS FOR ELECTRONIC, PHOTONIC, AND WEAR APPLICATIONS.