Nanograin Structures and Reactive Structures via Electron-beam PVD

The overall goals of this effort involve the development of high temperature reactive materials for a wide range of target defeat, including biological and chemical weapon threats. Phase I activities proposed the development of reactive nano-layeredstructures capable of providing shock-initiated thermal energy together with structural material stability. Having met these initial goals, the Phase II effort will focus on the design of production apparatus capable of producing net-shaped structurescapable of both structural stability and shock-initiated thermal energy release. While Phase I exploited the capabilities of magnetron sputtering for proof-of-principle, Phase II will focus on alternative production techniques including acceleratedmagnetron sputtering, electron beam physical vapor deposition, and mechanical alloying approaches. Equipment enhancements will be designed, procured, and implemented in this 2 year Phase II effort with the overall goal of demonstrating vapor depositionbuild-up to thickness levels required for military systems structural hardware. This effort will also provide design details for the transition from pilot-production to full-scale implementation, together with an economic analysis. Phase III willtransition to a full-scale production facility capable of producing structural items for missile technology, as well a wide range of other military and commercial applications. Phase II results will provide a pilot-plant capability for the production ofreactive (and non-reactive) multi-layer structures for military applications including anti-missile interceptors and