SBIR/STTR Research Award

SBIR Phase I: Embedded Electron Charge for Macro Scale Devices

Award identifier a838152554fd239f1b6e52dc9f16bd1e6d175307625eb664ec4ae2e5919fe3c0Awarding agency National Science Foundation

Award amount

$99,913

Program and phase

SBIR · Phase I

Award year

2007

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Elecsci Corporation
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
NSF 06-553
Topic code
AM

Research abstract

The Small Business Innovation Research (SBIR) Phase I project will expand the applicability of embedded electron charge technology by developing new techniques to store a large amount of electron charge at the interface of dissimilar insulators. Since electron injection using high electric fields will not work for thin films deposited on thick insulating substrates, alternative means must be developed for charge injection. Charge injection samples for this project will be fabricated by depositing alternating thin film layers of silicon dioxide and silicon nitride on thick fused silica substrates. The silicon nitride will be deposited using Low Pressure Chemical Vapor Deposition (LPCVD) process, while the silicon dioxide will be deposited using several methods. The proposed technology will allow a much broader product scope with mid-to-macro size applications, far beyond the present limitations of embedded charge micro devices. Applications include energy harvesting for personal power from heel strike from walking, modules for providing power for sensors throughout a vehicular system, and eventually exoskeleton energy harvesters for converting body motion to usable electrical power, greatly benefiting both military and civilian users.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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