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This Small Business Innovation Research (SBIR) Phase I project will demonstrate the feasibility of a multiple scanned-head Critical Dimension Atomic Force Microscope (CD-AFM) with high throughput as a CD metrology tool. Phase I will develop key design innovations for commercial in-line production quality control in: (a) multiple scanned CD-AFM heads, each dedicated to scanning one site; and (b) a modular, high-performance head design that enables greatly reduced move-acquire-measure (MAM) time. The principal commercial application is to replace CD Scanning Electron Microscopes (CD-SEMs) as the semiconductor industry's primary CD metrology tool for in-line production quality control. Other applications are seen in micromanipulators for microelectronics, including mask repair, and in biology