SBIR/STTR Research Award

Organoerbium Source Reagents for MOCVD of Erbium-Containing Alloys

Award identifier 2eb555cc48a8cedf8f0cd799a5ab87d86f453af61f8726862af0658b9f27f6c4Awarding agency Department of Defense · Missile Defense Agency

Award amount

$49,320

Program and phase

SBIR · Phase I

Award year

1992

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Advanced Technologies/Laboratories Intl
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

The use of optoelectronic materials, such as gallium arsenide, in applications ranging from fiber optics to solid-state lasers has been growing rapidly. The fabrication of these materials requires exacting control over material composition, purity, uniformity and production rate. Typically these materials contain small amounts of rare earth dopants or impurities which are designated to enhance the optoelectronic effect. Advanced Technology Materials, Inc. has designed novel precursors for these rare earth dopants. These new "source reagents" should facilitate the manufacturing process by increasing the efficiency of incorporation of dopants into optoelectronic materials effectively reducing cost and increasing quality at the same time.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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