SBIR/STTR Research Award

Electroformed High Resolution Thick Metal Film for Hyper-Dense Electronic Packaging

Award identifier 4cc8048a081865d22e4587278fdbd492388f0626bb5b315e3f94801056c8f8f6Awarding agency Department of Defense · Missile Defense Agency

Award amount

$300,000

Program and phase

SBIR · Phase II

Award year

1993

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Electrochemical Systems, Inc.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

20 microns thick metal film deposits at thin film resolutions will ensure densely integrated MCMs essential to advanced electronic devices such as onboard data and signal processing systems (OBDP). 99.8% dense and 99.8% pure monolithic and environmentally stable copper interconnects in analog applications will remove heat and control impedance with 5-10 times capacity. Two to three times higher chip density in digital MCMs will reduce signal amplitude losses, signal ground bounce and clock distribution variation. As digital clock speeds increase, power and ground line impedance can limit dynamic and static noise margins. Compared to conventional devices, ECSI interconnects will extend this limit two to three times. ECSI's proprietary technology will deliver superior products at high yields at reduced cost.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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