SBIR/STTR Research Award
Electroformed High Resolution Thick Metal Film for Hyper-Dense Electronic Packaging
Award amount
$300,000Program and phase
SBIR · Phase IIAward year
1993Award details
- Awarding agency
- Department of Defense
- Branch
- Missile Defense Agency
- Recipient company
- Electrochemical Systems, Inc.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
20 microns thick metal film deposits at thin film resolutions will ensure densely integrated MCMs essential to advanced electronic devices such as onboard data and signal processing systems (OBDP). 99.8% dense and 99.8% pure monolithic and environmentally stable copper interconnects in analog applications will remove heat and control impedance with 5-10 times capacity. Two to three times higher chip density in digital MCMs will reduce signal amplitude losses, signal ground bounce and clock distribution variation. As digital clock speeds increase, power and ground line impedance can limit dynamic and static noise margins. Compared to conventional devices, ECSI interconnects will extend this limit two to three times. ECSI's proprietary technology will deliver superior products at high yields at reduced cost.
Technology keywords
Not reported