SBIR/STTR Research Award

FLOAT ZONE SILICON SHEET GROWTH

Award identifier 36af2c6f8d88cc1d24c0996f0ee4d576389506a64c2448e740768fbb22cfdaaaAwarding agency National Science Foundation

Award amount

$45,733

Program and phase

SBIR · Phase I

Award year

1989

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Energy Materials Research
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

RESEARCH ON A NOVEL PROCESSING TECHNOLOGY TO PRODUCE SHEET MATERIALS FROM BULK SOLIDS IS PROPOSED. THE PRINCIPAL OBJECTIVE IS TO DEVELOP A MEANS TO PRODUCE HIGH QUALITY, LOWCOST SILICON RIBBON. THIS NEW TECHNOLOGY WHEN DEVELOPED WILL REDUCE THE COST OF SILICON WAFER PRODUCTION AND RESPONDTO THE NATIONAL NEED FOR INCREASED ON SHORE MANUFACTURING PRODUCTIVITY IN THE ELECTRONICS INDUSTRY. CURRENT SILICON WAFER PRODUCTION FROM CZOCHRALSKI GROWN CRYSTALS WASTES, THROUGH SAWING, LAPPING AND POLISHING OPERATIONS, UP TO 70 PERCENT OF THE ASGROWN CRYSTAL WHICH REPRESENTS A BILLION DOLLAR LOSS WORLD WIDE. SUCCESS OF THE NEW PROCESS WILL PRODUCE SINGLE CRYSTAL SILICON RIBBONS OF SEMICONDUCTOR QUALITY WITH A THREE-FOLD REDUCTION IN COST AND NO MORE THANA 10 PERCENT WASTE OF CRYSTAL MATERIAL.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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