SBIR/STTR Research Award

Epitaxial Growth Of High Bandgap III-V Semiconductor

Award identifier 9ab709552d3d43ddd0d7f69a5122cc947ed36039989aebce504f0b31e85e67deAwarding agency Department of Defense · Missile Defense Agency

Award amount

$375,000

Program and phase

SBIR · Phase II

Award year

1994

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
SDL Inc
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

SPECTRA DIODE LABORATORIES (SDL) PROPOSESS TO INVESTIGATE HIGH BANDGAP GaN RELATED ALLOYS FOR VISIBLE LASER DIODES AND HIGH TEMPERATURE ELECTRONIC DEVICES. THE PROPOSED DEVELOPMENT OF THE HIGH BANDGAP MATERIAL WILL RESULT IN LASER DIODES SPANNING ALL RANGE OF THE VISIBLE SPECTRUM ANF HIGH TEMPERATURE ELECTRONIC DEVICES THAT CAN OPERATE AT GREATER 200 DEGREE C. THE GOAL OF PHASE I IS EPITAXIAL GROWTH AND CHARACTERIZATION SELECTED ALLOYS. IN PHASE II, SDL WILL FURTHER REFINE AND DEVELOP THE PROCESSES DEMONSTRATED IN PHASE I TO ACHIEVE CW VISIBLE LASER DIODES. THE ADVANCEMENT OF THE GaN BASED SEMICONDUCTORS WILL RESULT IN BLUE LASER SOURCES AND HIGH TEMPERATURE EELECTRONIC DEVICES THAT WILL GREATLY IMPACT BOTH COMMERCIAL AND MILITARY APPLICATIONS INCLUDING HIGH PERFORMANCE OPTICAL STORAGE, COLOR PRINTING, COLOR REPROGRAPHICS. VISUAL DISPLAYS, HIGH TEMPERATURE AIRCRAFT ENGINE SENSORS.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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