SBIR/STTR Research Award
Investigation of Internal Thermal Oxidation (ITOX) in SIMOX
Award amount
$450,384Program and phase
SBIR · Phase IIAward year
1996Award details
- Awarding agency
- Department of Defense
- Branch
- Air Force
- Recipient company
- IBIS TECHNOLOGY CORP.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
A program is proposed to investigate effects of high temperature internal thermal oxidation (ITOX) on SIMOX material. In phase I, a fundamental understanding of transport of oxygen and kinetics of the internal oxidation process of the buried oxide will be investigated. Characterization of SIMOX wafers with ITOX will focus on the high temperature post-SIMOX processing will examine the ITOX process as a potential method for improvements of the electrical characteristics of the buried oxide and development of the SIMOX substrate with BOX characteristics matching thermal oxides. These improvements are needed for applications in advanced commercial and rad hard microelectronics.
Technology keywords
Not reported