Multivariate Monitor System for Plasma Etch Reactors

CHROMEX proposes to develop a monitor system for plasma etch reactors that will, in the Phase I program, demonstrate much improved endpoint detection when compared to currently availabe systems. The Phase II research will extend the monitoring capabilities to all important plasma parameters. The system will provide the feedback information to the reactor controller necessary to produce a flexible and intelligent manufacturing system. The monitor is based on an old technique, emission spectroscopy, but takes advantage of a number of recnet technological advances that make the new system possible. The key advances are: the unique CRHOMEX imaging spectrographs, the availability of high performance but inexpensive array detectors, fiber optic interfaces, and multivariate data calibration routines. Anticipated Benefits: This system will ultimately be capable of monitoring all important plasma etch variables, hence allow intelligent control of the etch process. This will enhance manufacturing capability in the microelectronic industry.