SBIR/STTR Research Award

Gas-Phase Deposition of Low Dielectric Polymers

Award identifier d1e8785cfefae096b6dd6777131d299f69aa6a0a73f54ebbb37df399fa9511b9Awarding agency Department of Defense · Missile Defense Agency

Award amount

$60,000

Program and phase

SBIR · Phase I

Award year

1995

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
Advanced Technologies/Laboratories Intl
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Phase I will develop a gas-phase process for the deposition of low dielectric constant polymers for use in integrated circuits. This process will utilize the firm's liquid delivery technology to deliver the reactants and grow films at high deposition rates. Polymerization will be induced by thermal activation on a heated substrate. This novel approach to polymeric film growth enables the deposition of a wide variety of polymers displaying low dielectric constants. This technique has broad applications for IC packaging, lithography and microelectronics processing.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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