SBIR/STTR Research Award

Ultrahigh Quality, Single-Crystal Bulk Silicon Carbide

Award identifier d4c72f4696f7d3c52eb69a5da6e50a807d691ef9ec98dd84386204e5d8a678a8Awarding agency Department of Defense · Missile Defense Agency

Award amount

$100,000

Program and phase

SBIR · Phase I

Award year

1997

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
INTRINSIC SEMICONDUCTOR CORP.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

Silicon carbide materials will revolutionize semiconductor devices for military and commercial markets. The material's wide bandgap, high electric field breakdown, high thermal conductivity give SiC capabilities that far exceed those of silicon or gallium arsenide. Despite significant progress in silicon carbide development, fundamental defects--most prominently micropipes--persist. If SiC is to support next-generation devices, improvement to SiC wafer quality is essential. This Phase I SBIR proposes novel starting materials and unique process conditions for bulk SiC growth. Higher quality, larger area SiC than currently exists would provide a dramatic boost for the development of high power switches, high temperature electronics, and blue emitters for high density memory, chemical detection, and ultraviolet detectors.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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