SBIR/STTR Research Award
WHILE USE OF GAAS IN ELECTRONICS IS GROWING RAPIDLY AND MAY APPROACH 10% OF ALL INTEGRATED CIRCUITS BY 1990, EFFICIENT AND ENVIRONMENTALLY SATISFACTORY METHODS FOR RECOVERING GALLIUM, A RARE METAL IN NATURE, FORM PROCESS SCRAP DO NOT EXIST.
Award amount
$39,000Program and phase
SBIR · Phase IAward year
1985Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- Bartlett Technologies
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
WHILE USE OF GAAS IN ELECTRONICS IS GROWING RAPIDLY AND MAY APPROACH 10% OF ALL INTEGRATED CIRCUITS BY 1990, EFFICIENT AND ENVIRONMENTALLY SATISFACTORY METHODS FOR RECOVERING GALLIUM, A RARE METAL IN NATURE, FORM PROCESS SCRAP DO NOT EXIST. HANDLING OF ARSENIC, A TOXIC SUBSTANCE AND EXPECTED CARCINOGEN IN MINUTE AMOUNTS, IS A PROBLEM BOTH WITH RESPECTTO WORKPLACE AND ENVIRONMENTAL LEVELS OF ARSENIC CONTAMIN- INATION. RESEARCH WILL BE CONDUCTED INTO METHODS OF RECOVER ING GALLIUM FROM SCRAP WHILE ISOLATING ARSENIC SAFELY. PRIMARY EMPHASIS WILL BE ON A SMELTING SEPARATION WITH ARSENIC COLLECTED IN AN ALLOY COLLECTOR AND GALLIUM OXIDIZEDINTO A SODA ASH SLAG. RESULTS FROM THIS APPROACH WILL BE COMPARED WITH DIRECT HYDROMETALLURGICAL METHODS; LEACHING, SOLVENT EXTRACTION, AND PRECIPITATION. THE POTENTIAL COMMERCIAL APPLICATION AS DESCRIBED BY THE AWARDEE: THE COMMERCIAL OBJECTIVE IS AN ECONOMIC METHOD OF RECOVERING GALLIUM FORM ELECTRONIC SCRAP WITHOUT ARSENIC CONTAMINATION OF THE WORKPLACE OR ENVIRONMENT. TECHNICAL SUCCESS WILL LEAD TO A COMMERCIAL PROCESS PLANT BY BARTLETT TECHNOLOGIES.
Technology keywords
Not reported