Advanced Transparent Conductive Coatings for Displays

Routine Metal-Organic Chemical Vapor Deposition (MOCVD) production of highly conductive and transparent ZnO films and application of these films in displays will be demonstrated in Phase I. We propose to grow highly conductive transparent ZnO films using MOCVD in a high speed rotating disk reactor (RDR). The goal of Phase I is to develop a low temperature (below 450oC) growth technique that economically produces large area, uniform ZnO films of high optical transparency more than 80%) in the visible range and low electrical resistivity (in the low 10-4 ohmcm). The development of advanced display coatings is strategic to the government to help lead in future HDTV/FPD development. Development of environmentally compliant ZnO films with high transmittance and high conductivity has tremendous market potential in (high definition) flat panel displays, light-emitting devices, photovoltaics cells, optical detectors, and other passive and active electronic and optoelectronic devices.