SBIR/STTR Research Award
SBIR Phase I: EUV Source for Semiconductor Metrology
Award amount
$99,518Program and phase
SBIR · Phase IAward year
2009Award details
- Awarding agency
- National Science Foundation
- Branch
- Not reported
- Recipient company
- KAPTEYN-MURNANE LABORATORIES, INC
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- TJNCNAL37AA5
- Solicitation number
- NSF 08-548
- Topic code
- EL
Research abstract
This Small Business Innovation Research Phase I project is to develop a coherent extreme ultraviolet (EUV) light source for industrial application in support of EUV lithography. The Broad impact of this project represents an area of fundamental interest to optical science. The High Harmonic Generation (HHG) process is the result of basic quantum physics at the extreme of high energy and short time scales. The development of phase matching techniques for HHG represents the precise coherent manipulation of matter on unprecedented short length and time scales. A further understanding may make it possible in future to generate coherent light at even shorter wavelengths, suitable for ultrahigh resolution biological imaging.
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- New materials for ultrafast laser technology at 2 µm wavelength
- Novel High Peak- and Average-Power Ultrafast Lasers using Parametric Beam Combination of Fiber Lasers
- Technology for ultrafast lasers at 2-µm wavelength
- Robust and Compact Ultrafast mid-IR Laser Technology for Driving Secondary Sources
- Novel high peak- and average-power ultrafast using parametric beam combination of fiber lasers
Research funding history
53 SBIR/STTR records share this UEI (2002–2025). Reported award amounts total $23,088,637. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Energy, Department of Defense, National Science Foundation, Department of Commerce