SBIR/STTR Research Award

Semiconductor-Insulator-Semiconductor (SIS) Power Device for High Temperature, Speed and Power Application

Award identifier 17b502295d5c4ef5deae92556b24f7d7a68362151b98df37ac12d14bf980b4a3Awarding agency Department of Defense · Missile Defense Agency

Award amount

$50,000

Program and phase

SBIR · Phase I

Award year

1993

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Award details

Awarding agency
Department of Defense
Branch
Missile Defense Agency
Recipient company
POWER TECHNOLOGY SERVICES (PTS), INC.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
Not reported
Topic code
Not reported

Research abstract

This proposal is for the development of an optically activated high voltage semiconductor switch device capable of switching loads on and off within nanoseconds or picoseconds. A device of this type would not be possible using the existing limitations imposed by the limited knowledge on the transport of both electrons and holes across a Metal-Insulator-Semiconductor (MIS), and Semiconductor-Insulator-Semiconductor (SIS) interface. In order to provide this type of a device, a uniform bilateral flow of electrons and holes must take place through the interface. To properly characterize this phenomena so that an optically activated gapped semiconductor device os this type can be developed, a Scanning Tunneling Microscope (STM) will be used to establish the ballistic electron and hole transport mechanisms in insulator and semiconductor interfaces. This characterization data will make it possible to develop a new design for high power switching devices. The development of a high voltage power semiconductor device with rapid response time capable of being optically switched within nanoseconds or picoseconds can then be accomplished using simultaneous tunneling of both holes and elctrons through the Semiconductor-Insulator-Semiconductor (SIS) interface. Two injecting semiconductor junctions (pn-, gap, p-n) based in Si, GaAs or Si C materials with ohmic contacts at both ends will be separated by a gap or oxide interface where tunneling of both electrons and holes can be enhanced (controlled?) by photon injection into the interface.

Technology keywords

Not reported

Agency intelligence

Department of Defense

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