Scale-up of RF Plasma Treated Capacitors for High Energy Density Applications
Award amount
$120,000Program and phase
SBIR · Phase IIAward year
1994Award details
- Awarding agency
- Department of Defense
- Branch
- Army
- Recipient company
- SIGMA TECHNOLOGIES INTERNATIONAL GROUP, INC.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Z9AXH5DHE639
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- Energy Buffer Capacitors for Use in Dynamic Power Conversion ACUs
- Physical Vapor Deposition (PVD) as a Method to produce High Aspect Ratio Conductive Flakes for Advanced Bispectral or Infrared (IR) Obscuration
- Energy Buffer Capacitors for Use in Dynamic Power Conversion ACUs
- Lightweight High Energy Density Capacitors for NASA AMPS and PPUs
- Lightweight High Energy Density Capacitors for NASA AMPS and PPUs
Research funding history
73 SBIR/STTR records share this UEI (1993–2021). Reported award amounts total $15,390,265. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Defense, National Aeronautics and Space Administration, National Science Foundation, Department of Energy, Environmental Protection Agency