SBIR/STTR Research Award
Epitaxially Grown, Germanium, Junction Field-Effect Transistor for Cryogenic Detectors
Award amount
$70,000Program and phase
SBIR · Phase IAward year
1994Award details
- Awarding agency
- National Aeronautics and Space Administration
- Branch
- Not reported
- Recipient company
- TLC Precision Wafer Technology, Inc.
- Proposal award date
- Not reported
- Contract end date
- Not reported
- UEI
- Not reported
- Solicitation number
- Not reported
- Topic code
- Not reported
Research abstract
An epitaxial grown Germanium - channel Junction Field Effect Transistor (Ge-JFET) is proposed to provide the most efficient, low noise cryogenically cooled detectors operating at 2 - 4¿K. Precisioned engineered lattice and doping epitaxial growth will eliminate material defects to allow the Germanium superior low temperature mobilities to be utilized in the most efficient cryogenic temperature transistors technology available (JFETs). The low resistance Al/Pd contacts on the engineered p-n-p structure will result in Ge-channel JFET detectors with very low noise at audio frequencies (lOHz), high input impedance and low power dissipation. TLC expect to demonstrate Ge-JFETs with less than l0nV of noise at lOOHz and 4¿K. This proposal summarizes how TLC will develop and demonstrate the material, fabrication and performance advantages of epitaxial grown Ge-JFETs for cryogenically cooled detector for
Technology keywords
Not reported