SBIR/STTR Research Award

SBIR Phase I: Enabling large-scale manufacturing of organic electronic devices using photolithography

Award identifier 17499afb91e642197203ed4bbffa7bc3f2385932f0b59fdb4597da79650af6f2Awarding agency National Science Foundation

Award amount

$150,000

Program and phase

SBIR · Phase I

Award year

2009

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
Orthogonal, Inc
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
NSF 09-541
Topic code
NM

Research abstract

This Small Business Innovation Research Phase I project will develop a method of patterning chemically sensitive organic electronic materials using photolithography and other standard cleanroom processes. The technology is based on the development of a fluorous based photoresist. The process to be developed will not damage organic semiconductors, which are destroyed by most organic solvents and water. The technology will solve many of the problems that plague the organic electronics industry, particularly related to OLED manufacturing. The technology has the potential to enable large scale manufacturing of OLED displays using existing LCD equipment, dramatically lower the cost and improving yields by using proven techniques.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

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