SBIR/STTR Research Award

SBIR Phase II: Novel Deposition of Silicon Carbide Boules

Award identifier 01a576845a6810c74e2ee8c2390903294e19ef0a34e2e72eb95b3ba5d745bcafAwarding agency National Science Foundation

Award amount

$500,000

Program and phase

SBIR · Phase II

Award year

2008

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
SiC Systems, Inc.
Proposal award date
Not reported
Contract end date
Not reported
UEI
Not reported
Solicitation number
NSF 06-553
Topic code
MI

Research abstract

This Small Business Innovation Research (SBIR) Phase II project will develop a novel processing technique to form silicon carbide (SiC) boules for wafer production. The technique uses high-purity gas precursors and has the potential to economically produce large diameter SiC boules with low contamination levels and reduced defect levels. In this project, SiC boule growth using gas-phase precursors will be developed for commercialization of 150 mm SiC wafers. SiC is a wide bandgap compound semiconductor with high thermal conductivity, high breakdown electric field strength, thermal stability and chemical inertness. SiC-based electronics are of great interest because they can significantly outperform conventional semiconductors under high-temperature, high-power, high-radiation, and corrosive conditions. Potential products based on SiC include engine control eletronics, turbine engine sensors, power switching devices, microwave electronics, and many others.

Technology keywords

Not reported

Agency intelligence

National Science Foundation

Back to SBIR/STTR Research Awards

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