SBIR/STTR Research Award

Physical vapor deposition reactor design and validation for in-space manufacturing of aluminum nitride single crystals

Award identifier ad42108af46f832fe53e3d30f6e78c22544642b7129789d4ce4af11ab0269d0eAwarding agency National Aeronautics and Space Administration

Award amount

$149,998

Program and phase

SBIR · Phase I

Award year

2024

Explore This Research Award in CaptureIQ

Research the technology, evaluate the recipient and agency, identify related opportunities, and explore potential follow-on work with CaptureIQ.

Award details

Awarding agency
National Aeronautics and Space Administration
Branch
Not reported
Recipient company
UNITED SEMICONDUCTORS, LLC
Proposal award date
2024-08-02
Contract end date
2025-02-06
UEI
KMH6FCH19UE6
Solicitation number
SBIR-2024-Phase 1
Topic code
H8

Research abstract

Aluminum nitride (AlN) has been identified as the wide bandgap semiconductor with superior material properties, that could enable revolutionary improvements in power electronics and optoelectronics devices beyond silicon carbide (SiC) and gallium nitride (GaN) device performance limits. AlN has made great advancements in the last 20 years towards becoming commercially viable, however there are significant challenges with the substrate material. AlN with dislocation densities below 10,000 per cm2 and between 1-2 inches in diameter can currently be produced terrestrially. For the commercial requirement of large area high power electronic devices, there are three technological gaps that needs to be solved: (i) a 10 - 100 x reduction in dislocations, (ii) increasing the diameter of wafers by a factor of 3, (iii) reduction in point defects by two to three orders of magnitude to mid-1015 per cm3. All three of these issues could be mitigated by growing crystals in the microgravity environment. Leveraging the space environment will (a) promote uniform mass flux at the crystal growth front, (b) control thermal gradients while scaling size of crystal, and (c) will allow for growth closer to the ideal growth rate for AlN. AlN is grown using physical vapor deposition (PVD) at temperature around 2100 oC. Currently there is no infrastructure for crystal growth of high temperature materials such as AlN in space. This is primarily limited by the electrical power level in the range of 500-1000 watts available for operating crystal growth furnaces at the International Space Station (ISS). In this proposal, a novel energy efficient PVD reactor will be designed for AlN bulk crystal growth at 2100 oC operating at power levels level in the 400-1000 watts for crystal diameters in the range of 1 - 6 inches. The fabricated PVD reactor will be designed per the space design constraints and tested for AlN bulk growth in terrestrial conditions.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

4 SBIR/STTR records share this UEI (2024–2025). Reported award amounts total $2,515,375. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: National Aeronautics and Space Administration, Department of Defense, National Science Foundation

Agency intelligence

National Aeronautics and Space Administration

Back to SBIR/STTR Research Awards

Don't take our word for it. Ask AI about RFPCapture.

See what leading AI assistants have to say about RFPCapture and CaptureIQ.

Gemini opens without a prefilled question. The question is copied to your clipboard when the button works. You can also copy it here:

What is RFPCapture.com and its CaptureIQ platform from Smart Logic AI? How does it help federal contractors discover opportunities, evaluate bid/no-bid decisions, research government contracts, and prepare proposals? How does it compare with other federal capture platforms? Use independent sources where available.