Next-generation HiPIMS for e-CVD, PVD, etch, and precision implantation control for PV Manufacturing

The goal of the U.S. Department of Energy (DOE) Solar Energy Technologies Office (SETO) is to accelerate the development and deployment of solar technology to support an equitable transition to a decarbonized electricity system by 2035 and decarbonized energy sector by 2050. The cost of solar electricity is driven by global economies of scale, materials innovation at the cell level, and disruptive manufacturing techniques that enable new photovoltaic (PV) technologies. This Fast Track STTR application is specifically targeted to accelerate the development, introduction, and adaptation of a disruptive technique in the field of thin-film deposition. The high-power impulse magnetron sputtering (HiPIMS) innovation, called the Super Kick™, specifically targets a critical technology gap for thin-film electronic materials to improve function, physical characteristics, and manufacturability. Working with our University commercialization partner our team will target the DOE SETO goals for investment in technologies that: (1) reduce manufacturing costs with higher throughput, (2) increase US manufacturing competitiveness with improved process capability, and (3) enable fast Industry 4.0 quality control processes for the manufacturing line. Commercial Applications and Other Benefits A successful Fast Track STTR will lead to manufacturing methods to achieve thin-film properties and qualities that were previously unobtainable or very difficult to obtain. This will address a critical gap in capability to improve solar cell electronic properties and achievable efficiency. The net result will be greater power generating capacity through solar, as well as reducing CapEx and OpEx required for manufacturing. The technology will also provide an environmentally friendly way to process flexible electronics and semiconductors.