SBIR/STTR Research Award

SBIR Phase II: Manufacturable Implementation of Thin Glass for Next Generation Electronics Packaging

Award identifier 93ea493507f9955087997a81e0c18e5ec9a35f06647c5fc8cd9f52323dc60a93Awarding agency National Science Foundation

Award amount

$747,957

Program and phase

SBIR · Phase II

Award year

2020

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
MOSAIC MICROSYSTEMS LLC
Proposal award date
2020-04-01
Contract end date
2022-03-31
UEI
JPLDLBVEEUP2
Solicitation number
Not reported
Topic code
EW

Research abstract

The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase II project is to develop a packaging platform for the next generation communications electronics, particularly for 5G applications for defense and commercial use. Enabling the processing of thin glass substrates for next-generation communications and packaging needs will mean faster communications with improved power efficiency. The wide range of applications and end markets include mobile devices and infrastructure, automotive radar, internet of things, and other uses. This Small Business Innovation Research (SBIR) Phase II project enables thin glass packaging solutions to be processed in existing semiconductor factories. As the need for data volume drives wireless technology towards frequency bands in the 30-100 GHz range, commonly used packaging substrates begin to fail. Glass is an attractive alternative due to its dimensional stability, smooth surfaces, low RF absorption up to 100 GHz, limited dielectric constant variation with temperature, and moisture insensitivity. Reduced thickness also decreases interconnect length (yielding low loss and low latency) and reduces overall product thickness. Thin glass can be difficult to handle in a free-standing state. In this project, thin glass using a novel handling solution will be fully metallized and patterned on both sides, creating test structures verifying through-glass via integrity, reliability, and robustness. Optimized metallization approaches will be explored, along with improvements to second-side processing, for commercially relevant wafer substrates. This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

11 SBIR/STTR records share this UEI (2019–2023). Reported award amounts total $5,028,938. Reported amounts are not federal obligations.

Phases: Phase I, Phase II, Phase II – Direct to Phase II

Agencies: Department of Defense, National Science Foundation

Agency intelligence

National Science Foundation

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