Scanning Tunneling Microscope based Hydrogen Depassivation Lithography Automation Via Artificial Intelligence
Award amount
$149,915Program and phase
STTR · Phase IAward year
2019Award details
- Awarding agency
- Department of Energy
- Branch
- Not reported
- Recipient company
- ZYVEX LABS, LLC
- Proposal award date
- 2019-02-19
- Contract end date
- 2020-02-18
- UEI
- ZUUFP2XW3YH8
- Solicitation number
- DE-FOA-0001940
- Topic code
- 16a
Research abstract
Technology keywords
Not reported
Other awards by this recipient
Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.
- High Temperature Overgrowth of Delta Layers to Enable 3D Dopant-Based Quantum Devices
- Atomically Precise Scanning Probe Based Analysis of Activated Dopants for 2D Micro Electronics
- Atomically Precise Ultra-High Performance 2D Micro Electronics
- High-Speed Platform for Highly Parallel STM Lithography and Hierarchical Assembly
- SCANNING TUNNELING MICROSCOPE BASED HYDROGEN DEPASSIVATION LITHOGRAPHY AUTOMATION VIA ARTIFICIAL INTELLIGENCE
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Cryogenic optical and spin scanning probe station for high-throughput characterization of solid-state quantum defects
- High-Sensitivity and Broadband Terahertz Focal Plane Arrays Based on Plasmonic Photoconductive Nanocavities
- Additive manufacturing to enable high performance salt-hydrate based thermal energy storage products
- High-Sensitivity and Broadband Terahertz Focal Plane Arrays Based on Plasmonic Photoconductive Nanocavities
- Perfectly-Absorbing Photoconductive Metasurfaces for High Efficiency Ultrafast Optoelectronic Switches
Research funding history
11 SBIR/STTR records share this UEI (2018–2024). Reported award amounts total $6,560,152. Reported amounts are not federal obligations.
Phases: Phase I, Phase II
Agencies: Department of Energy, Department of Defense