SBIR/STTR Research Award

SBIR Phase I: Direct Write Printing of Metals by In-Situ Plasma Jetting for Flexible Hybrid Electronics

Award identifier e69ecaeda69e68e14ab018c0e12bbdef0b73fe3ac24f4b17b04dcf5237231ffdAwarding agency National Science Foundation

Award amount

$224,830

Program and phase

SBIR · Phase I

Award year

2018

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Award details

Awarding agency
National Science Foundation
Branch
Not reported
Recipient company
SPACE FOUNDRY INC
Proposal award date
2018-07-01
Contract end date
2019-06-30
UEI
UCFGEJKCK285
Solicitation number
Not reported
Topic code
MN

Research abstract

This Small Business Innovation Research Phase I project is focussed on developing a plasma jet printing technology to serve the printed electronics industry. Printed electronic devices including flexible electronics and flexible hybrid electronics (FHE) are next generation smart devices that have applications in both consumer and industrial segments. These devices combine the flexibility and low cost of printed substrates made of plastic with the performance of semiconductor devices to create a new category of electronics. The main challenge in FHE is integration of semiconductor die to the flexible substrate and interconnects. Plasma jet printing has high potential to address the problems associated with printed electronics manufacturing, in particular the interconnects. The plasma process control allows printing metallic materials with required electronic properties by in-situ treatment, thereby eliminating the need for post processing. The global market for printed electronics equipment is $1.5 billion in 2017 and is estimated to reach $4 billion globally in 2020 and growing at a compound annual growth rate of 38%. Immediate industrial application of our technology is in replacing wire bonding with direct write printing of metallic interconnects for flexible hybrid electronics. The intellectual merit of this project is in developing a plasma jet print head hardware for direct write printing of conducting metallic interconnects with reduced process steps. The project focus will be on technological de-risking of the print head hardware and process de-risking for reliable and re-producible printing. Developing the plasma process that can be used for pre-treatment of substrate, in-situ treatment of nanoparticles, printing and post processing all in one tool and simultaneously can reduce the process steps, number of equipments needed and time taken for manufacturing. Oxidation of metal nanoparticle ink and its limited shelf life is currently being addressed by polymer capping of the nanoparticles and thermal/laser processing. Developing a plasma process that can be used to print high quality conducting patterns using in-situ treatment can take the technology closer to adoption by printed electronics industry. The anticipated outcome of this project is a robust plasma jet print head and a process that can reliably and reproducibly print conducting metal films with tailored oxidation state and electronic structure. This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Research funding history

7 SBIR/STTR records share this UEI (2018–2025). Reported award amounts total $1,803,621. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: National Aeronautics and Space Administration, Department of Defense, National Science Foundation, Department of Energy

Agency intelligence

National Science Foundation

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