SBIR/STTR Research Award

Atomic Layer Deposition of PbZrxTi1-xO3 Thin Films for PiezoMEMS Applications

Award identifier 5628ce11cca0e8cdd101f81151c71af8b6a6899937afd40bf19b3d3b90eed5ceAwarding agency Department of Defense · Army

Award amount

$750,000

Program and phase

STTR · Phase II

Award year

2014

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
STRUCTURED MATERIALS INDUSTRIES, INC.
Proposal award date
2014-09-29
Contract end date
2015-09-30
UEI
WMLSF59AE7E1
Solicitation number
2012.0
Topic code
A12a-T020

Research abstract

In this STTR program, Structured Materials Industries, Inc. (SMI) and partners will develop hardware and process technology to deposit uniform films of piezoelectric PbZrxTi1-xO3, on substrates with complex 3-dimensional topography. Piezoelectric PbZrxTi1-xO3 films are a critical technology for advanced Micro Electro Mechanical System (MEMS), to provide low power actuation in nanoscale devices. Our technical approach is based on atomic layer deposition (ALD), which can achieve the required uniform film deposition over the extreme topography of advanced MEMS. The successful conclusion of this work will enable the development of micro robotic devices, for future biomedical, imaging and communication applications.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

177 SBIR/STTR records share this UEI (1992–2024). Reported award amounts total $45,517,958. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, Department of Energy, National Aeronautics and Space Administration, National Science Foundation, Department of Commerce, Department of Homeland Security

Agency intelligence

Department of Defense

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