SBIR/STTR Research Award

High Temperature (300 °C) Silicon Carbide (SiC)-Based Integrated Gate Drivers for Wide Bandgap Power Devices

Award identifier c6a30d736a7a3764cf5487afeaf3dad23413efb93912981d4ff40e2818c2bdf4Awarding agency Department of Energy

Award amount

$149,824

Program and phase

SBIR · Phase I

Award year

2013

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Award details

Awarding agency
Department of Energy
Branch
Not reported
Recipient company
Arkansas Power Electronics International, Inc.
Proposal award date
2013-06-10
Contract end date
Not reported
UEI
QZMVB44SHW19
Solicitation number
DE-FOA-0000801
Topic code
08d

Research abstract

SiC power semiconductors have the capability of greatly outperforming Si-based power devices. Smaller switching and on-state losses coupled with higher voltage blocking capability, and especially its high operating temperature make SiC the ideal semiconductor for high performance, high power density power modules. One major factor limiting the switching speed, and thus power loss of these devices, is the parasitic inductance between the gate driver and the switch. The inductance will limit the rise time of the gate current which will limit how fast the gate voltage can increase. This inductance can be minimized by placing the gate driver very close to the power device; however, this increases the ambient temperature of the gate driver up to the maximum junction temperature of the power switch. In addition to this ambient temperature, the gate driver will produce its own losses, increasing the gate driver junction temperature even further. Thus, the full power density advantages of SiC hinge on the successful and reliable realization of this technology at very high temperatures ( & gt; 300 C). High temperature operation introduces a set of technological barriers. APEI, Inc. researchers have developed solutions to some of these barriers and have proven the feasibility of SiC power electronics operating at high temperature. A void exists, however, in the full realization of these highly efficient power modules. Currently there are no high temperature integral solutions to meet the particular requirements of driving a SiC field-effect transistor (FET) (e.g., high switching frequency, high voltage transient immunity, high temperature). Approaches with discrete components are large with reduced reliability and added parasitics. The ideal solution is a compact, highly integrated, and flexible gate driver that could be rapidly implemented with its associated switch. In this Phase I proposal, APEI, Inc. will continue development of its patented high temperature gate driver technology, enabling the next generation of high-efficiency, high power density converters. At the conclusion of Phase I, APEI, Inc. will design, fabricate, and demonstrate a high temperature (300 C) gate driver utilizing discrete SiC circuitry while concurrently developing high temperature packaging techniques to enable reliable operation of the drivers over an extended period of time. These designs will then be transitioned directly into an all-SiC integrated circuit (IC) process in Phase II.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

59 SBIR/STTR records share this UEI (2003–2015). Reported award amounts total $19,645,087. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, Department of Energy, National Science Foundation, Department of Transportation

Agency intelligence

Department of Energy

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