Sub-wavelength Structure Patterning Using Roll-to-Roll Processing

The goal of this proposed work is to explore and develop an innovative patterning method of sub-wavelength structures using roll-to-roll proceesing (patterning, pattern transfer and pattern placement). The proposed solution aims to achieve high throughput, low resolution, and capable of patterning and placing various nanomembranes materials. Figures 1 and 2 describe the major steps that will be used to pattern very fine scale structures by roll to roll nanoimprinting and several related processes on flexible supporting substrate. During Phase I, Nanonex will design and build a roll to roll imprinting tool to pattern nanostructures on UV cured resist on top of nanomembranes supported by flexible substrate. This patterned resist will be used as an etching mask to transfer nanopatterns on to nanomembranes during reactive ion etching afterward. After removal of the residual resist, the nanomembranes can be placed on curvature glass substrate for use in sensing or flat substrate for use in plasmonic solar cells through air cushion press. The unique advantages of the proposal is that we are the inventor and a key developer of many critical technologies used in the proposal. The participation of Prof. Chou group at Princeton University would be in the mold fabrication.