SBIR/STTR Research Award

High Speed E-O Polymer Photonic Devices by Nickel Template Replication with Transferred Traveling Wave Electrode

Award identifier d2dea673cb1a8b5f0f3e30b97a824134f7a341436e72b544af53835e8ad72347Awarding agency Department of Defense · Defense Advanced Research Projects Agency

Award amount

$98,907

Program and phase

SBIR · Phase I

Award year

2011

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Award details

Awarding agency
Department of Defense
Branch
Defense Advanced Research Projects Agency
Recipient company
OMEGA OPTICS, INC.
Proposal award date
2011-03-01
Contract end date
Not reported
UEI
U11BUN3J3E88
Solicitation number
2010.3
Topic code
SB103-004

Research abstract

In this program, Omega Optics and the University of Texas at Austin propose to develop a cost effective UV imprinting technology using high quality metallic mold by directly electroplating nickel over photoresist patterns on transparent quartz substrate. Unlike any existing nano-imprinting technology which requires ion etching to transfer patterns into substrate, we can directly replicate template patterns into the bottom cladding through a low pressure UV imprinting process operated at room temperature. Additionally, we invent a new concept of molding-and-wire-transferring for the traveling wave electrodes. Instead of electroplating amorphous metal electrode, we transfer bulky gold wires with much better conductivity to the predefined position formed by metallic molding as well. Therefore it can achieve more than 60GHz bandwidth due to the low resistance traveling wave electrode. Given advantages of the high quality metallic template and the energy efficient imprinting fabrication, this project is expected to reduce fabrication cost for polymer photonic devices with improved performances. In the phase I program, we anticipate to demonstrating the feasibility of using nickel template based UV imprinting technology for the fabrication of polymer photonic devices. These devices are expected to show lower optical insertion loss and higher bandwidth compared with conventional photolithography and ion etched devices.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

83 SBIR/STTR records share this UEI (2002–2024). Reported award amounts total $23,209,205. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, National Science Foundation, Department of Health and Human Services, Department of Energy, Department of Commerce

Agency intelligence

Department of Defense

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