SBIR/STTR Research Award

Massively Parallel Micromachining with Ultrafast Lasers

Award identifier 08f84ef284296264398b6fdb63295185b6daa3c36b2f0b7cfa7b36a0467e9bb8Awarding agency Department of Defense · Air Force

Award amount

$747,507

Program and phase

STTR · Phase II

Award year

2010

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Award details

Awarding agency
Department of Defense
Branch
Air Force
Recipient company
KAPTEYN-MURNANE LABORATORIES, INC
Proposal award date
2009-11-30
Contract end date
2011-11-30
UEI
TJNCNAL37AA5
Solicitation number
2008.A
Topic code
AF08-T029

Research abstract

We are proposing to develop a highly parallel, rapid prototyping system for the manufacture of microfluidic devices. In this phase II proposal we will build a complete system for making such devices for continued research on fieldable microfluidic systems for use in the military, and in hospitals. The project will also allow manufacturing in widely different materials, and structures, without any post chemical processing necessary. BENEFIT: The commercial benifits and commercial applications are appearing even before we submit this proposal. Two customers (see support letters) are already inquiring about devices. KMLabs plans to use this micromachining system as a foundry for making prototype microfluidic devices, but also as production facility. We are looking to gain investment in this field to further our capability for the production of these devices.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

53 SBIR/STTR records share this UEI (2002–2025). Reported award amounts total $23,088,637. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Energy, Department of Defense, National Science Foundation, Department of Commerce

Agency intelligence

Department of Defense

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