SBIR/STTR Research Award
Template-based Lithography for Advanced Low-Volume Electronics
Award amount
$98,660Program and phase
SBIR · Phase IAward year
2009Award details
- Awarding agency
- Department of Defense
- Branch
- Defense Advanced Research Projects Agency
- Recipient company
- LITHOGRAPHIC TECHNOLOGY CORP. DBA AMPHIB
- Proposal award date
- 2009-01-27
- Contract end date
- 2009-09-30
- UEI
- Not reported
- Solicitation number
- 2008.2
- Topic code
- SB082-043
Research abstract
The goal of the proposed project is to develop regular interferometric based template lithography and demonstrate its feasibility for cost effective, high resolution nanofabrication of low volume electronics. The challenges of the project are based on the requirement to meet the needs of sub-32nm CMOS device fabrication using technologies that are not currently addressed by the ITRS. Design strategies will be developed for the interferometric lithography (IL) imaging system, the integration of the system to a projection lithography (PL) or electron beam lithography (EBL) trim operation, and the identification of suitable processes for template based lithography for 32nm and sub-32nm application. This will be carried out using current design fundamentals of the ASI XIS interference lithography system scaled up to meet CMOS device fabrication needs.
Technology keywords
Not reported
Awards with the same topic code
Verified by an exact topic code match. This is not a text-similarity match.
- Template-based Lithography for Advanced Low-Volume Electronics
- Low Cost, Sub-32nm Hybrid Imprint & E-beam Template for Low-Volume Manufacturing
- Integrating Molecular Transfer Lithography with Electron Beam Lithography for Low-Volume Sub-32 nm CMOS Processing