Conductive Ink for High Resolution 3-D Printing

The Army is seeking a low-cost process for applying EMI grid patterns to the concave surface of a missile dome. Applied Nanotech, Inc. (ANI) is a leader in the development of metallic nano-inks for challenging application requirements; Optomec has developed a breakthrough multi-axis direct-write print head that generates an aerodynamically focused aerosol stream that can be used to print feature sizes down to 10 microns onto planar and non-planar substrates. ANI proposes to collaborate with Optomec in an SBIR program to develop a nano-scale conductive ink for high resolution 3-D printing with the aerosol jet technology. In Phase I, ANI and Optomec will conduct laboratory research and development culminating in a proof of concept demonstration of the grid application process by accurately printing the design pattern onto a flat surface of a substrate comprised of a candidate dome material and verifying a sheet resistance of the printed pattern of < 1 ohm per square.