SBIR/STTR Research Award

FABRICATION OF HIGH ASPECT RATIO Cu AND BRASS NANOFLAKES FOR IR OBSCURANT APPLICATIONS

Award identifier c54a264b947ad4dadbafd710ba3fb6d0013bc4ea5f3af05a8f6de97c4fcd5fd6Awarding agency Department of Defense · Army

Award amount

$730,000

Program and phase

SBIR · Phase II

Award year

2008

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Award details

Awarding agency
Department of Defense
Branch
Army
Recipient company
SIGMA TECHNOLOGIES INTERNATIONAL GROUP, INC.
Proposal award date
2008-11-20
Contract end date
2011-05-30
UEI
Z9AXH5DHE639
Solicitation number
2007.2
Topic code
A07-121

Research abstract

The US Army is seeking to develop an IR obscurant material for military operations and high aspect ratio, conductive, metallic nanoflake (HANF) is under consideration. Conductive nanoflakes have been demonstrated to be excellent screeners of IR when used in advanced countermeasure devices such as smoke grenades or smoke pots. The primary objective of the Phase II effort is to further develop and scale up the conductive nanoflake fabrication process successfully demonstrated during Phase I and produce about 25kg of brass and copper nanoflake using a commercially viable process.

Technology keywords

Not reported

Other awards by this recipient

Verified by the same UEI. These are other public SBIR/STTR award pages, not a merged company record.

Awards with the same topic code

Verified by an exact topic code match. This is not a text-similarity match.

Research funding history

73 SBIR/STTR records share this UEI (1993–2021). Reported award amounts total $15,390,265. Reported amounts are not federal obligations.

Phases: Phase I, Phase II

Agencies: Department of Defense, National Aeronautics and Space Administration, National Science Foundation, Department of Energy, Environmental Protection Agency

Agency intelligence

Department of Defense

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