Continuously Variable Attenuated-Phase-Shifted Photomask for Integrated Spectroscopic Sensor Platforms enabled by Optical Nanolithography

Redondo Optics Inc. (ROI), a world leader in engineering and manufacturing of leading-edge nano-materials, optical sensors, fiber and integrated optics, and advanced photonics instrumentation proposes to develop and demonstrate for the first time the concept of an etch-less, deep-UV, fully continuously variable attenuated-phase-shifted mask (ConvaPSMT) technology to enable ultra-high resolution, optical nanolithography techniques for the cost effective production of integrated terahertz-frequency spectroscopic chemical and biological sensor platforms. The ConvaPSMT technology can be produced on quartz, fluorinated quartz, or calcium fluoride substrates to produce a continuously variable attenuated-phase-shifted photomask that allows the lithographic production of ?100-nm features using conventional contact or projection aligners or state-of-the-art interferometric lithography (IL), interferometric imaging lithography (IIL), or liquid immersion lithography (LIL) systems. This proposal addresses the problem of facilitating a higher resolution and higher throughput capability by improving the structure of phase-shift masks used to produce biological and chemical integrated spectroscopic sensor platforms using next generation nanolithography techniques. The ConvaPSMT technology will readily find uses in the military, government, and commercial sectors for applications in nanoelectronics, photonics, molecular electronics, spintronic, microfluidic, or nano-mechanical (NEMS) technologies.